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AIXUV GmbH

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AIXUV GmbH (pronounced: aex-u-v) is a supplier of sources, components and systems using Extreme Ultraviolet radiation. AIXUV's core product is the compact gas discharge based EUVlamp which is used for the development of components for EUV lithography and for new analytical approaches.

Extreme Ultraviolet radiation (XUV) is the spectral range between X-rays and vacuum ultraviolet. The spectral range is defined by the fact that the photoeffect of inner-shell electrons is the dominating interaction process with matter. XUV includes spectral ranges known as soft X-rays (used for investigations of living cells) and EUV (of interest for future chip lithography). Extreme Ultraviolet radiation offers simultaneously the potential of lateral resolution down to 10 nanometers and the highest cross sections for the interaction of radiation with matter. This makes XUV of special interest for future chip production and for nanotechnology.

Our EUV-lamps are designed to supplement storage ring beamlines for enabling applications in the individual R&D lab. Our team is developing customer specific solutions for components up to fully automatic complex system solutions. Step-by-step communicated development with our customers has proofed to be most efficient and successful approach. AIXUVÂ’s EUV-lamps reach electrode lifetimes beyond 1000 hours and are routinely tailored for a variety of applications.

EUV-lamps are used by our customers for the development of metrological tools for characterizing EUV-sources and in EUV-microscopes. Tools based on our EUV-lamps have been developed customer specific and are used e.g. for characterization of EUV-Resist (EUV-test-exposer TEUL) and characterizing EUV-Maskblanks (EUV-Reflectometer: MBR).